This work presents a detailed spectrophotometric analysis of tantalum pentoxide (Ta2O5) thin films deposited for use in military optical components, with measurements conducted in the visible spectral range of 400–800 nm. The primary objective is to evaluate how the thickness of thin films and its surface and interface boundary roughness influence the optical response, particularly reflectance characteristics, which are critical for applications such as anti-reflective coatings, optical filters, and stealth-related technologies for military use.
This paper presents the method of the optical analysis of thin films with defects. The attention is devoted to the defects consisting in boundary roughness. This method is based on interpreting the spectral dependences of the diffuse reflectance of light [1-5]. Thin films are used in the optical and military industries and in military applications, for example for the creation of anti-reflective layers or laser mirrors [6]. The numerical analysis confirms the fundamental influence of the parameters of the defects of thin films on the diffuse reflectance.